Sirona
Valdueza Felip
Profesor/a Titular Universidad
Grenoble Alpes University
Saint-Martin-d’Hères, FranciaPublications in collaboration with researchers from Grenoble Alpes University (12)
2019
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Influence of the AlInN Thickness on the Photovoltaic Characteristics of AlInN on Si Solar Cells Deposited by RF Sputtering
Physica Status Solidi (A) Applications and Materials Science, Vol. 216, Núm. 1
2018
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Influence of the AlN interlayer thickness on the photovoltaic properties of in-rich AlInN on Si heterojunctions deposited by RF sputtering
AIP Advances, Vol. 8, Núm. 11
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Quality improvement of AlInN/p-Si heterojunctions with AlN buffer layer deposited by RF-sputtering
Journal of Alloys and Compounds, Vol. 769, pp. 824-830
2017
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In-rich AlxIn1-xN grown by RF-sputtering on sapphire: From closely-packed columnar to high-surface quality compact layers
Journal of Physics D: Applied Physics, Vol. 50, Núm. 6
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P-i-n InGaN homojunctions (10–40% In) synthesized by plasma-assisted molecular beam epitaxy with extended photoresponse to 600 nm
Solar Energy Materials and Solar Cells, Vol. 160, pp. 355-360
2016
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Dependence of the photovoltaic performance of pseudomorphic InGaN/GaN multiple-quantum-well solar cells on the active region thickness
Applied Physics Letters, Vol. 108, Núm. 16
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III-nitride-based waveguides for ultrafast all-optical signal processing at 1.55 μm
Physica Status Solidi (A) Applications and Materials Science, Vol. 213, Núm. 5, pp. 1269-1275
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Morphology and arrangement of InN nanocolumns deposited by radio-frequency sputtering: Effect of the buffer layer
Journal of Crystal Growth, Vol. 434, pp. 13-18
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Study of high In-content AlInN deposition on p-Si(111) by RF-sputtering
Japanese Journal of Applied Physics
2015
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Effect of the barrier thickness on the performance of multiple-quantum-well InGaN photovoltaic cells
Japanese Journal of Applied Physics, Vol. 54, Núm. 7
2014
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Effect of the quantum well thickness on the performance of InGaN photovoltaic cells
Applied Physics Letters, Vol. 105, Núm. 13
2009
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Non-linear properties of nitride-based nanostructures for optically controlling the speed of light at 1.5 μm
Microelectronics Journal, Vol. 40, Núm. 2, pp. 349-352